menu

Small PVD Thin Film Deposition Coating Machine Coater System For Metals And Organics

Contact Person:Gilia Ding


Email: gilia@inthelaboratory.com

Tel:+86 177 5900 4070
Telephone:+86-177-59004070
Whatsapp: +86 177 5900 4070
Wechat:Dingqiuna



  • Item no.:

    Lith-PD-ZD01
  • Payment:

    L/C, T/T, Western Union, Credit Cards, Paypal
  • Lead Time:

    7 days
  • Compliance:

    CE Certified
  • Warranty:

    Two years limited standard warranty
Categories
  • Product Detail

Small PVD Thin Film Deposition Coating Machine System For Metals And Organics



Lith-PD-ZD01-High-Vacuum Evaporation Coating System


Product Overview

This system is a compact, multi-source high-vacuum evaporation coating platform designed for laboratory use, capable of depositing thin films of metals, organics, and other functional materials. It is ideal for:

· Research labs (metal electrode fabrication, SEM sample preparation).

· Advanced materials development (organic thin films).

· Process optimization (high-precision coatings for novel material synthesis).


Key Advantages vs. Competing Systems

Feature

This System

Typical Competing Systems

Vacuum Speed

15–20 min to high vacuum (≤5×10⁻⁵ Pa)

Often 30+ min for similar vacuum levels.

Film Uniformity

±3%–5% thickness deviation

Typically ±5%–10% in entry-level models.

Chamber Material

304 stainless steel (high corrosion resistance)

Some use aluminum or lower-grade steel.

Modularity

Supports 1–3 evaporation sources (expandable)

Fixed configurations common in low-end systems.

Footprint

Compact (500×360×420mm for desktop model)

Larger benchtop units often >600×500mm.


Technical Specifications

Parameter

Specification

Vacuum Chamber

304 stainless steel, cylindrical (Φ260×H350 mm)

Internal Coating Area

~Φ260×H310 mm

Ultimate Vacuum

≤5×10⁻⁵ Pa

Pumping Speed

≤8×10⁻⁴ Pa in 30 min, holds ≤5 Pa for 12 hours

Substrate Stage

- Max size: 80×80 mm (standard) / 120 mm diameter (rotary)

 - Rotation: 0–20 RPM (magnetic fluid sealed)

Film Uniformity

<5% (120 mm diameter area)

Evaporation Sources

2–3 sources (metal/organic compatible, co-evaporation or switching)

Power Supply

2 kW, constant current/power modes

Electrical

AC 220 V / 50 Hz, 3.5 kW

Dimensions (L×W×H)

- Main unit: 600×500×900 mm

 - Desktop model: 500×360×420 mm


Why This System Stands Out?

1. Speed & Efficiency

o Achieves high vacuum 50% faster than comparable models, reducing idle time.

2. Precision Engineering

Stainless steel chamber + optimized gas paths ensure minimal contamination and long-term stability.

3. Flexible Configurations

o Modular design allows easy upgrades (e.g., adding a third evaporation source).

4. Space-Saving

30% smaller footprint than conventional systems, critical for crowded labs.


Ideal For:

✔ Universities studying thin-film physics.
✔ R&D centers developing flexible electronics or OLEDs.
✔ Industrial labs requiring high-repeatability coatings.

Order Note: Minimum 1 unit. Custom configurations available.

PVD Deposition

Related products

Home

Products

skype

whatsapp