Mini DC Ion Sputtering Carbon Coater Coating Machine System

Model: Lith-BY-JS02- DC Ion Sputtering Coater

Product Overview

The Lith-BY-JS02 Ion Sputtering Coater is a DC (direct current) sputtering deposition system based on a two-electrode DC sputtering principle—a simple, reliable, and cost-effective coating technology widely adopted in industrial applications.

Beyond its fundamental design, the SD-160 features:

· A dedicated sample sputtering chamber

· Vacuum gauge and sputtering current meter

· Adjustable sputtering current controller

· Micro vacuum valve and timer

· Integrated automated circuitry for precise control of chamber pressure, ionization current, and process gas selection, ensuring optimal coating quality.

Key Innovations

· Durable rubber-sealed bell jar design prevents vacuum leakage and edge chipping during prolonged use.

· Ceramic-sealed high-voltage electrode outperforms conventional rubber seals in longevity.

· Large-capacity sputtering chamber and optimized target area ensure uniform, contaminant-free coatings.

· High-stability solenoid valves and a dual-gas-path automatic control system enhance sample protection and film quality.

Ideal for:

· SEM sample preparation in electron microscopy labs

· Electrode fabrication for R&D research

Technical Specifications

Features Highlight

1. Leap Vacuum Pump: High-performance pumping for consistent vacuum levels.

2. Dual-Gas Control: Isolated gas paths safeguard sample integrity.

3. User-Centric Design: Timed sputtering, adjustable parameters, and modular stage options streamline operation.

Note: Parameters are default for standard configuration. Customizations (e.g., target materials, voltage) available upon request.