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Benchtop Multi-Layer Metal Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film

Contact Person:Gilia Ding


Email: gilia@inthelaboratory.com

Tel:+86 177 5900 4070
Telephone:+86-177-59004070
Whatsapp: +86 177 5900 4070
Wechat:Dingqiuna



  • Item no.:

    Lith-ZY-ZD01
  • Payment:

    L/C, T/T, Western Union, Credit Cards, Paypal
  • Lead Time:

    7 days
  • Compliance:

    CE Certified
  • Warranty:

    Two years limited standard warranty
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  • Product Detail

Benchtop Multi-Layer Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film



Lith-ZY-ZD01-Multi-Layer Deposition for Metals, Alloys & Dielectric Thin Films


Product Overview

The Lith-ZY-ZD01 is a desktop thermal evaporation system designed for high-precision thin-film deposition in research and small-scale production. Featuring a turbomolecular pump vacuum system and multi-source evaporation capabilities, it enables efficient deposition of metals, alloys, and dielectric films with minimal operator training.


Key Features & Advantages

1. Wide Application Range

· Materials Research: Metal films, dielectric layers, polymer coatings.

· Functional Devices: Thin-film sensors, optical coatings, nanoelectronics.

· Multi-Layer Deposition: Supports up to 99 layers in a single run.

2. User-Friendly Operation

· Plug-and-play design—no specialized lab environment required.

· 10-inch touchscreen for intuitive control and process monitoring.

· Preloaded 100+ deposition recipes for quick setup.

3. High Precision & Stability

· Quartz crystal monitoring ensures real-time thickness control (≤3% uniformity).

· Turbo-molecular pump (300L/s) achieves ≤6×10⁻⁵ Pa ultimate vacuum.

· 3 independent evaporation sources prevent material cross-contamination.

4. Flexible Configuration

· Optional: Co-evaporation for alloys, 400°C substrate heating, and cooled rotating stage.

· Automatic & manual modes for customized process control.

5. Low Maintenance & Compact Design

· Aluminum chamber for efficient heat dissipation.

· 65 kg weight, suitable for benchtop use in labs or offices.


Technical Specifications

Parameter

Specification

Chamber

Ø300 × 350(h) mm (quartz glass)

Vacuum System

300L/s turbomolecular pump + dual-stage rotary pump

Ultimate Vacuum

≤6 × 10⁻⁵ Pa (after baking)

Leak Rate

≤5.0 × 10⁻⁹ Pa·L/s

Deposition Rate

≥10 nm/min (material-dependent)

Film Uniformity

≤3% (with rotation)

Evaporation Sources

3 independent thermal sources

Max Layers per Run

99 layers (up to 4 materials)

Control Interface

10" touchscreen with programmable recipes

Power Supply

AC 230V, 32A, 50Hz

Cooling Water (Optional)

0.2 MPa, 15–25°C, ≥8 L/min


Operational Workflow

1. Automated Deposition: Pre-programmed vacuum pumping, heating, and evaporation.

2. Multi-Layer Control: Supports time-based or thickness-based deposition modes.

3. Remote Monitoring: Adjust parameters via network connection.


Why Choose ?

✔ Combines research-grade performance with desktop convenience.
✔ Minimal training required—ideal for multi-user environments.
✔ Scalable for both experimental and small production needs.

Thermal Evaporator


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