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High Vacuum RF+DC Magnetron Ion Sputtering Coater Coating Machine
Model: Lith-BY-JS12| – Product Specifications
Technical Specifications
|
Parameter |
Specification |
|
Vacuum Pump System |
Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set |
|
Rotary Pump Speed |
50Hz: 16m³/h (4.4 L/s) | 60Hz: 19.2m³/h (5.2 L/s) |
|
Molecular Pump Speed |
300 L/s |
|
Ultimate Vacuum |
5 × 10⁻⁴ Pa |
|
Working Pressure |
0.5 – 5 Pa |
|
Pump-Down Time |
>10 min (to 10 Pa) |
|
Vacuum Measurement |
Range: Atmosphere to 10⁻⁴ Pa |
|
Gas Control |
Mass Flow Controller (MFC) |
|
Chamber Size |
φ260mm × 200mm (Metal Chamber) |
|
Magnetron Target Source |
Target Size: φ50mm × 3mm (Copper) Compatible with Weakly Magnetic Materials |
|
Operation Method |
Manual Control (Instruction Manual Provided) |
|
Weight / Dimensions |
100kg / 610mm (L) × 420mm (W) × 490mm (H) |
|
Power Supply |
AC 110V 60Hz or AC 220V 50Hz |
|
Power Consumption |
<3000W |
|
Cooling System |
Air Cooling (Pump) + Water Cooling (Sputtering Target) |
|
Warranty |
1-Year Limited Warranty with Lifetime Technical Support |
Key Features & Applications
Core Advantages
Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings.
2. High Vacuum Stability
Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films.
3. Flexible Compatibility
·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples.
·φ50mm target supports copper and weakly magnetic materials for diverse applications.
4. Efficient Cooling System
·Water-cooled target minimizes thermal load during high-power sputtering.
· Air-cooled pump reduces maintenance costs for continuous operation.
Typical Applications
·Research Fields
Thin film deposition, nanostructured coatings, semiconductor device development.
·Industrial Uses
Optical coatings, wear-resistant layers, surface modification of electronic components.
IPv6 network supported 