Glovebox Vacuum Thermal Evaporation Coating Machine Unit With Multi-Source

Lith-TK-ZD01-High-Vacuum Multi-Source Evaporation

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Key Specifications

Advantages & Competitive Features

1. Superior Film Uniformity & Repeatability

· ≤ ±5.0% thickness variation ensures high-quality, consistent coatings—better than many entry-level systems (±8–10%).

· Ideal for precision optics, semiconductor layers, and functional coatings where uniformity is critical.

2. Multi-Source Flexibility for Advanced Applications

· 2-3 independently controlled evaporation sources allow multi-layer & alloy deposition in a single run.

· Competitors often limit to single-source setups, requiring multiple cycles for complex coatings.

3. Enhanced Process Control & Adaptability

· Optional PLC/PC automation improves repeatability vs. manual systems, reducing human error.

· Wide temperature range (RT–300°C) supports diverse materials, from delicate polymers to high-temp substrates.

4. Space-Efficient & User-Oriented Design

· Compact footprint (1m × 1.2m) fits small labs, unlike larger industrial systems (e.g., 1.5m+ width).

· Front-loading vertical chamber simplifies maintenance and sample handling vs. bulky horizontal designs.

Comparison with Similar Systems

Recommended Applications

· R&D & Prototyping: Universities and labs needing controllable, small-batch coatings.

· Optoelectronics: Anti-reflective films, conductive layers for displays/sensors.

· Decorative Coatings: Durable metallic finishes on consumer products.