3D Magnetron Sputtering PVD Coating System For SEM Sample Preparation

Model:  Lith-ZK-JS04- DC Ion Sputtering Coater

Technical Specifications

Parameter	Specification
Target Materials	Standard: Au (Gold), 57mm diameter × 0.1mm thick  Optional: Pt (Platinum)
Standard Sample Holder	Holds 12 SEM stubs, height adjustment range: 60mm
Rotating/Tilting Stage (Optional)	Rotation: 0–60 rpm (continuously adjustable)  Tilt: -90° to +90° (continuously adjustable)  Standard rotating platform: 40mm diameter (holds 4 sample holders, custom sizes available)  Dual locking mechanism for secure fixation
Sputtering Current	5–30mA (microprocessor-controlled, programmable)
Meters	Vacuum: Atm – 1×10⁻³ mbar  Current: 0–99mA
Control Method	Microprocessor with Start/Pause buttons  Programmable time (1–999s)  Auto-pumping, sputtering, and venting
Vacuum System	Pumping speed: 133 L/min  Ultimate vacuum: 10⁻⁴ mbar  Noise level: 56 dB

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Key Features & Applications

1. Precision and Flexibility

· Adjustable sputtering current (5–30mA) and rotating/tilting stage enable uniform thin-film deposition for diverse sample geometries.

· Dual locking mechanism prevents sample displacement during operation.

2. High-Quality Coating

· Gold (Au) and Platinum (Pt) targets ensure high-purity conductive coatings for SEM and analytical applications.

3. Automated & User-Friendly Operation

· Programmable controls and auto-venting enhance efficiency and safety.

4. Compact & Low-Noise Design

· Stainless steel chamber (120mm × 75mm) with observation window (120mm × 45mm) provides durability and visibility.

· Low 56 dB noise level ensures a comfortable working environment.

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Ideal Applications

· SEM sample preparation (conductive coating)

· Thin-film deposition for research and industrial applications

· Multi-sample processing (supports 12 SEM stubs)

· Angle-dependent deposition (with optional rotating/tilting stage)

This sputtering system is optimized for laboratories requiring high precision, automation, and versatile coating capabilities.