Glovebox Automatic Smart Magnetron Sputtering Coater For Delicate & Oxidation-Sensitive Samples Of SEM, Battery, Biological
Model: Lith-ZK-JS03-Coater for Delicate & Oxidation-Sensitive Samples Of SEM, Battery, Biological
Product Highlights
· User-friendly LCD touchscreen for simplified operation
· Fully automated vacuum process for sample preparation
· Automatic gas release for safe handling
· Wide sputtering current range (5–45mA) for flexible applications
· High sputtering efficiency for fast, uniform coating
· Ultra-fine particle size (6–10nm) for superior film quality
· No sample surface heating—ideal for temperature-sensitive materials
Applications
Designed for integration into gloveboxes, this sputtering coater is ideal for oxidizable, contamination-sensitive samples, including:
· SEM sample preparation
· Electrode material research
· Battery separators, filtration membranes
· Biological specimens & delicate substrates
Technical Specifications
Core Parameters
Parameter
Specification
Sputtering Current
5–45mA (adjustable)
Operating Mode
Fully automatic magnetron sputtering
Sputtering Voltage
600V (fixed)
Target Materials
Gold or Platinum (standard, select one); optional: Ag, Ti, Cr, Al, Cu, Pb
Vacuum Level
<1Pa
Vacuum Pump
Oil-sealed rotary vane pump (1L/s); optional dry scroll pump
Additional Features
· Chamber Dimensions: Ø128×130mm
· Sample Holders: 1ר90mm, 4ר25mm, 6ר15mm cups
· Power Supply: 220V/50Hz (110V customizable)
· Max Power Consumption: 450W
· Particle Size: 6–10nm
· Working Gas: Air or argon
· Protection Mechanisms: Overcurrent cutoff (>50mA), vacuum interlock (>100Pa)
Key Advantages
· Uniform, fine-grained coatings with excellent adhesion
· Zero thermal damage—perfect for heat-sensitive substrates (e.g., polymers, biomaterials)
· Compact glovebox-compatible design for inert-atmosphere processing
Why Choose?
This system combines high-performance sputtering with glovebox compatibility, ensuring contamination-free deposition for advanced materials research. Its cold sputtering capability and sub-10nm particle size make it a top choice for critical applications in energy storage, life sciences, and nanotechnology.
Product Highlights
· User-friendly LCD touchscreen for simplified operation
· Fully automated vacuum process for sample preparation
· Automatic gas release for safe handling
· Wide sputtering current range (5–45mA) for flexible applications
· High sputtering efficiency for fast, uniform coating
· Ultra-fine particle size (6–10nm) for superior film quality
· No sample surface heating—ideal for temperature-sensitive materials
Applications
Designed for integration into gloveboxes, this sputtering coater is ideal for oxidizable, contamination-sensitive samples, including:
· SEM sample preparation
· Electrode material research
· Battery separators, filtration membranes
· Biological specimens & delicate substrates
Technical Specifications
Core Parameters
Parameter
Specification
Sputtering Current
5–45mA (adjustable)
Operating Mode
Fully automatic magnetron sputtering
Sputtering Voltage
600V (fixed)
Target Materials
Gold or Platinum (standard, select one); optional: Ag, Ti, Cr, Al, Cu, Pb
Vacuum Level
<1Pa
Vacuum Pump
Oil-sealed rotary vane pump (1L/s); optional dry scroll pump
Additional Features
· Chamber Dimensions: Ø128×130mm
· Sample Holders: 1ר90mm, 4ר25mm, 6ר15mm cups
· Power Supply: 220V/50Hz (110V customizable)
· Max Power Consumption: 450W
· Particle Size: 6–10nm
· Working Gas: Air or argon
· Protection Mechanisms: Overcurrent cutoff (>50mA), vacuum interlock (>100Pa)
Key Advantages
· Uniform, fine-grained coatings with excellent adhesion
· Zero thermal damage—perfect for heat-sensitive substrates (e.g., polymers, biomaterials)
· Compact glovebox-compatible design for inert-atmosphere processing
Why Choose?
This system combines high-performance sputtering with glovebox compatibility, ensuring contamination-free deposition for advanced materials research. Its cold sputtering capability and sub-10nm particle size make it a top choice for critical applications in energy storage, life sciences, and nanotechnology.
|
Parameter |
Specification |
|
Sputtering Current |
5–45mA (adjustable) |
|
Operating Mode |
Fully automatic magnetron sputtering |
|
Sputtering Voltage |
600V (fixed) |
|
Target Materials |
Gold or Platinum (standard, select one); optional: Ag, Ti, Cr, Al, Cu, Pb |
|
Vacuum Level |
<1Pa |
|
Vacuum Pump |
Oil-sealed rotary vane pump (1L/s); optional dry scroll pump |








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