Au/Carbon Magnetron Sputter Depostion Coater Machine PVD System For SEM
Model: Lith-HZ-JS03- Au/Carbon Coating Magnetron Sputter Coater
Product Overview
The Lith-HZ-JS03 Dual-Target Magnetron Ion Sputtering Coater, independently developed with cutting-edge technology, sets a new benchmark for sample preparation instruments. It integrates dual-target co-sputtering and multi-layer single-sputtering capabilities, featuring a standard rotating/tilting module for multi-angle, uniform film coverage. This design eliminates charging effects, enhances sample contrast, and delivers high-resolution, true-to-life morphological characterization—ideal for advanced material science and biological research.
Technical Specifications
Category
Parameter
Specification
Core Parameters
Model
HZ-JS03
Vacuum Chamber (mm)
160 × 120
Sputtering Voltage
300–700 V
Sample Stage (mm)
Adjustable 80–100 diameter
Sputtering Type
Magnetron
Working Vacuum
2–10 Pa
System Configuration
Power Supply
100–250 VAC, 50/60 Hz
Target Size (mm)
φ50 × 0.1
Control System
5" Touchscreen (ARM)
Max. Power Consumption
100 W
Process Control
Sputtering Current
10–50 mA (±1 mA)
Sputtering Time
0–600 s (±1 s)
Ultimate Vacuum
<1 Pa
Safety & Monitoring
Vacuum Measurement
Digital Pirani Gauge
Protection
Current/Vacuum interlock
Instrument Highlights
1. SEM-Optimized Coating Performance
· Dual-target configuration: Enables sequential Au/Pt and Carbon deposition without breaking vacuum
· 2-10Pa working vacuum: Specialized for minimum oxidation during conductive coating
· <5nm particle size: Finer than conventional sputter coaters (typically 10-20nm)
2. Intelligent Process Control
· 300-700V voltage range with 1mA precision – 30% wider than standard systems for optimal film density
· Real-time plasma monitoring prevents arcing on sensitive samples
3. Ergonomic Design
· 160mm large chamber: Accommodates tall SEM stubs (up to 25mm) and irregular specimens
· Tool-free target change
Target Applications
▸ Life Science: Coating for pollen, plant tissues, and hydrated biological samples
▸ Materials Research: Nanowires, polymer films, and porous materials
▸ Failure Analysis: PCB cross-sections and insulating components
Operational Advantages
· One-cycle coating: 12 samples/batch (50% more than competitors)
· Zero thermal damage: Magnetron confinement keeps samples <40°C
· Self-diagnostics: Automatic pump protection and target life counter
|
Category |
Parameter |
Specification |
|
Core Parameters |
Model |
HZ-JS03 |
|
|
Vacuum Chamber (mm) |
160 × 120 |
|
|
Sputtering Voltage |
300–700 V |
|
|
Sample Stage (mm) |
Adjustable 80–100 diameter |
|
|
Sputtering Type |
Magnetron |
|
|
Working Vacuum |
2–10 Pa |
|
System Configuration |
Power Supply |
100–250 VAC, 50/60 Hz |
|
|
Target Size (mm) |
φ50 × 0.1 |
|
|
Control System |
5" Touchscreen (ARM) |
|
|
Max. Power Consumption |
100 W |
|
Process Control |
Sputtering Current |
10–50 mA (±1 mA) |
|
|
Sputtering Time |
0–600 s (±1 s) |
|
|
Ultimate Vacuum |
<1 Pa |
|
Safety & Monitoring |
Vacuum Measurement |
Digital Pirani Gauge |
|
|
Protection |
Current/Vacuum interlock |
▸ Materials Research: Nanowires, polymer films, and porous materials
▸ Failure Analysis: PCB cross-sections and insulating components








Tel : +86-592-3926659
Email : gilia@inthelaboratory.com









IPv6 network supported