Auto Magnetron Sputtering Deposition System For Thin Film Fabrication Of Semiconductor & MEMS

Model: Lith-PC-JS09 -Multi-target, Multi-film Deposition

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1. Specifications

Parameter	Specification
Chamber Design	Single-chamber, vertical front-loading (stainless steel/vacuum-grade materials)
Base Vacuum	≤5×10−5 Pa
Pump-down Time	100 min (to ≤5×10−4 Pa after N2 venting)
Leak Rate	≤5×10−7 Pa·L/s
Magnetron Targets	3 × 3-inch (2 standard-field, 1 high-field, DC/RF compatible, Kurt J. Lesker)
Power Supplies	1 × RF (600 W, 13.56 MHz), 2 × DC (1000 W, AE Corp.)
Substrate Stage	3-position, rotating (5–30 RPM), heated (up to 450°C), bias voltage (1000 V)
Target-Substrate Distance	40–120 mm (80–120 mm with ion source)
Gas Control	2-channel MKS mass flow controllers (Ar + reactive gases)
Film Thickness Uniformity	≤5% on 2-inch area (Cu/Al: 4–5 µm, Ni/PTFE: 1–2 µm)
Adhesion Test	Passes 3× tape test (glass, Si, ceramic substrates)
Additional Features	Reverse sputtering, anode-layer ion source, safety interlocks, computer control

2. Key Features & Benefits

✔ High-Precision Deposition

· Uniform films with ≤5% thickness variation, ideal for research and prototyping.

· Multi-layer capability (e.g., Al/Ni, Al/PTFE) with automated target switching.

✔ Advanced Process Control

· Computer-controlled deposition (temperature, rotation, gas flow).

· Ion-assisted deposition enhances film density and adhesion.

✔ Flexible & Reliable Design

· Three-target system supports diverse materials (metals, dielectrics, semiconductors).

· Substrate heating (450°C) and rotation ensure high-quality coatings.

✔ Research-Optimized Safety

· Fail-safe protections (water/power interlocks, anti-misoperation).

· Controlled environment with bake-out and contamination liners.

3. Ideal Applications

· Academic & Industrial R&D: Thin-film studies, optoelectronics, protective coatings.

· Semiconductor & MEMS: Precise metal/dielectric layers for device fabrication.

· Advanced Materials: Hard coatings (e.g., tooling), functional films (e.g., PTFE).

4. Why Choose This System?

· Repeatable results with automated workflows.

· Imported critical components (Kurt J. Lesker targets, AE power supplies) ensure reliability.

· Compact footprint with full-featured capabilities for labs.