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Manual Compact Magnetron Ion Sputtering Coater For Thin Film Fabrication
Model: Lith-ZK-JS05- Compact Ion Sputtering Coater
Overview
The Lith-ZK-JS05 Compact Ion Sputtering Coater is designed for depositing conductive gold films on samples for scanning electron microscopy (SEM). With user-friendly operation, it is an essential tool for sample preparation in small to medium-sized SEM laboratories.
Key Applications
· Gold ion sputtering for SEM sample coating.
· Compatible with target materials: Au, Pt, Cr, Ag, Ti, Cu, Ni, Au-Pd alloy, etc.
Technical Specifications
Category
Specification
Chamber Material
Glass
Chamber Dimensions
Ø100 mm (diameter) × 130 mm (height)
Sample Stage (Small)
Ø40 mm (holds 6 sample cups simultaneously)
Sample Stage (Large, Optional)
Ø60 mm
Gold Target Size
Ø58 mm
Vacuum Pump
Two-stage direct-drive rotary vane pump (1 L/s)
Vacuum Measurement
Pirani gauge
Vacuum Protection
20 Pa with fine-adjustment gas inlet valve
Working Gases
Air / Argon (dedicated inlet with flow control)
Features & Advantages
· Robust Design – Special sealing structure minimizes glass chamber damage.
· High Compatibility – Supports Au, Pt, Cr, Ag, Ti, Cu, Ni, and Au-Pd alloy targets.
· Precision Control – Adjustable gas flow and vacuum protection ensure uniform coatings.
· Efficient Workflow – Dual-stage platform allows batch processing (6 samples at once).
Recommended Applications
✔ SEM Sample Prep – Ideal for non-conductive specimen coating.
✔ Materials Research – Thin-film deposition for nanotechnology studies.
✔ Industrial QC – Reliable performance for repeatable conductive layering.
Overview
The Lith-ZK-JS05 Compact Ion Sputtering Coater is designed for depositing conductive gold films on samples for scanning electron microscopy (SEM). With user-friendly operation, it is an essential tool for sample preparation in small to medium-sized SEM laboratories.
Key Applications
· Gold ion sputtering for SEM sample coating.
· Compatible with target materials: Au, Pt, Cr, Ag, Ti, Cu, Ni, Au-Pd alloy, etc.
Technical Specifications
Category
Specification
Chamber Material
Glass
Chamber Dimensions
Ø100 mm (diameter) × 130 mm (height)
Sample Stage (Small)
Ø40 mm (holds 6 sample cups simultaneously)
Sample Stage (Large, Optional)
Ø60 mm
Gold Target Size
Ø58 mm
Vacuum Pump
Two-stage direct-drive rotary vane pump (1 L/s)
Vacuum Measurement
Pirani gauge
Vacuum Protection
20 Pa with fine-adjustment gas inlet valve
Working Gases
Air / Argon (dedicated inlet with flow control)
Features & Advantages
· Robust Design – Special sealing structure minimizes glass chamber damage.
· High Compatibility – Supports Au, Pt, Cr, Ag, Ti, Cu, Ni, and Au-Pd alloy targets.
· Precision Control – Adjustable gas flow and vacuum protection ensure uniform coatings.
· Efficient Workflow – Dual-stage platform allows batch processing (6 samples at once).
Recommended Applications
✔ SEM Sample Prep – Ideal for non-conductive specimen coating.
✔ Materials Research – Thin-film deposition for nanotechnology studies.
✔ Industrial QC – Reliable performance for repeatable conductive layering.
|
Category |
Specification |
|
Chamber Material |
Glass |
|
Chamber Dimensions |
Ø100 mm (diameter) × 130 mm (height) |
|
Sample Stage (Small) |
Ø40 mm (holds 6 sample cups simultaneously) |
|
Sample Stage (Large, Optional) |
Ø60 mm |
|
Gold Target Size |
Ø58 mm |
|
Vacuum Pump |
Two-stage direct-drive rotary vane pump (1 L/s) |
|
Vacuum Measurement |
Pirani gauge |
|
Vacuum Protection |
20 Pa with fine-adjustment gas inlet valve |
|
Working Gases |
Air / Argon (dedicated inlet with flow control) |
· High Compatibility – Supports Au, Pt, Cr, Ag, Ti, Cu, Ni, and Au-Pd alloy targets.
· Precision Control – Adjustable gas flow and vacuum protection ensure uniform coatings.
· Efficient Workflow – Dual-stage platform allows batch processing (6 samples at once).
✔ Materials Research – Thin-film deposition for nanotechnology studies.
✔ Industrial QC – Reliable performance for repeatable conductive layering.
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