Three Head Plasma Sputtering Coater Inside Glovebox
VTC6003HDGB is a three-head plasma sputtering coater in a glovebox (O2 & H2O < 1 ppm). This system is designed for researching solid-state thin-film Lithium batteries, also suitable for sequential coating of multiple-layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, etc.
Features
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Three 2" magnetron sputtering guns for co-sputtering or layer by layer growth.
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Choice of RF and DC power sources
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Integrated with a glovebox (O2 & H2O < 1 ppm)
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Easy sample transfer inside a glovebox.
SPECIFICATIONS
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Power
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208-240VAC, single phase, 50/60 Hz, 1500 W
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Glovebox VGB-6
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High-quality purification system ensures O2 and H2O below 1 PPM
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Stainless steel chamber, 1200 mm L x 740 mm W x 900 mm H
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Hinged-type front door for loading devices and samples easily
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Automatic purging to evacuate air before recirculating purification
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Automatic regeneration function
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Two Antechambers for large and small samples delivery
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DC/RF Power Supplies
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Three sputtering power sources
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Two DC source: 500 W power for coating metallic materials
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One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials
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Magnetron Sputtering Head
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Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters
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Two are connected to DC sources for metallic materials
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One is connected to the RF source for non-conductive materials
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Target size: 2" diameter with a thickness of 0.1 - 5 mm
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Sputtering targets are optional
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Recommended Sputtering Recipe and Useful Tips
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Vacuum Chamber
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Stainless steel vacuum chamber: Ø300 × 300 mm H
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One 100 mm glass view port.
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Hinged type top flange for easy sample access
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Here is a glance of the vacuum chamber
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Sample Stage
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Ø140 mm rotating and heating sample stage up to 500°C
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Rotation speed: 1 - 20 rpm
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Single-point programmable temperature controller
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Gas & Flow Control
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Two mass flow controllers (MFC)
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Flow rate: 0 – 200 sccm
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nitrogen calibrated
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1/4" vent port.
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Vacuum Pumping Station
(Optional)
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For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station is recommended
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Turbo pump .
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63 L/s turbomolecular pump, or
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260 L/s turbomolecular pump
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Backing pump
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240 L/min rotary vane pump, or
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200 L/min dry scroll pump
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Water Chiller
(Optional)
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Chilled water is required
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One digital temperature-controlled recirculating water chiller is recommended
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Refrigeration range: 5~35 °C
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Flow rate: 16 L/min
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Pump pressure: 14 psi
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Film Thickness Measurement
(Optional)
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Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å
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Compliance
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CE approval
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NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.
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