Small Ion DC Sputtering Coater For Conductive Film Preparation of SEM

Model:  Lith-ZK-JS02-DC Ion Sputtering Coater

Product Overview

The Lith-ZK-JS02 DC Ion Sputtering Coater adopts a microcontroller as its core processor, featuring independent intellectual property and excellent scalability for customized development. Equipped with a 5.1-inch touch LCD screen, it intuitively displays set parameters such as sputtering current, sputtering time, working current, and remaining time.

Key Specifications

· Sputtering Current: 3–30 mA (continuously adjustable, step: 1 mA)

· Sputtering Time: 1–600 sec (step: 1 sec)

· Safety Interlocks: Dual protection for sputtering current and vacuum level, ensuring immediate shutdown upon triggering to prevent damage.

· Sample Capacity:

o 4 × φ25 mm samples or 6 × φ15 mm samples

o Single sample cup accommodates up to φ50 mm samples.

· Vacuum Performance:

o Ultimate vacuum: <1 Pa

o Pumping speed: 1 L/s

o Chamber size: φ108 × 130 mm

· Additional Features:

o Real-time curves for sputtering current & vacuum level.

o Adjustable screen brightness.

o System/usage time tracking for targets.

Technical Parameters

Category	Specifications
Operation Mode	Magnetron Sputtering
Input Voltage	AC 220V ± 10%, 50Hz
Working Voltage	DC 2400V
Max Power Consumption	500W (host + mechanical pump)
Target Materials	Au, Pt, Au-Pd alloy, Ag, Pb, Cu, Cr, Sb, etc.
Sputtering Gas	Air or Argon
Chamber Material	High-borosilicate glass (φ128 × 100 mm)
Vacuum Pump	Two-stage rotary vane pump (1 L/s)
Sample Stage	φ90 mm (or φ25 × 4 / φ15 × 6)
Dimensions (L×W×H)	424 × 271 × 255 mm
Weight (Host)	11 kg
Operating Environment	5–40°C, <60% RH
Storage Environment	-10–60°C, <80% RH

Product Highlights

✔ Fully Automated Control – No manual needle valve adjustment required.
✔ Quick-Target Replacement – Patented clamp structure for effortless swaps.
✔ Special Seal Design – Protects glass components from damage.
✔ Adjustable Sample Stage – Smooth height adjustment via sliding rod.
✔ Built-in Operation Guide – User-friendly interface for instant proficiency.

Applications

Ideal for conductive film coating in SEM sample preparation, this ensures simplicity and efficiency. Compatible with a wide range of target materials (Au, Pt, Ag, Cu, etc.) and sputtering gases (Air/Ar).