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High-Precision Multi-Target Magnetron Sputter Coating System Coater
Model: Lith-PC-JS11 – Product Specifications
Specifications
| Category | Parameter | Details |
|---|---|---|
| Vacuum Performance | Ultimate Vacuum (Sputtering Chamber) | ≤6.6×10⁻⁶ Pa |
| System Leak Rate | ≤5.0×10⁻⁷ Pa·L/S | |
| Pump-Down Time (Atmosphere → 6.6×10⁻⁴ Pa) | ≤30 min | |
| Vacuum Retention (After 12 Hours Shutdown) | ≤5 Pa | |
| Sputtering Chamber | Structure | Vertical, top-opening, stainless steel (argon-welded, electropolished) |
| Dimensions | ≥Ø300 mm × 300 mm (with anti-contamination liner) | |
| Bakeability & Sealing | 100–150°C; metal gasket/fluororubber O-ring | |
| Magnetron Sputtering | Target Configuration | 3 × 50 mm adjustable-angle permanent magnet targets (RF/DC/MF compatible) |
| Power Supply | 2 × DC (≥500 W), 1 × auto-matching RF (≥500 W) | |
| Film Uniformity | ≤5% deviation | |
| Additional Features | 3 × SMC rotary shutters; magnetic material support | |
| Substrate Stage | Sample Capacity | 1 × ≥100 mm diameter |
| Rotation Speed | 0–30 RPM (adjustable) | |
| Heating Range | RT–500°C (PID-controlled, thermocouple feedback) | |
| Gas Delivery | Mass Flow Control | 2 paths (100 SCCM + 20 SCCM MFCs, CF16 valves) |
| Auxiliary Gas Lines | 2 × DN16 inlet valves | |
| Pumping System | High-Vacuum Pump | Pfeiffer Hipace 700 (680 L/s) + 4 L/s rotary pump |
| Valves & Pipeline | DN40/CC150 pneumatic valves, stainless steel bellows | |
| Control & Safety | Automation | PLC + industrial PC + touchscreen (real-time monitoring/logging) |
| Protection | Interlocks for water/power faults (overcurrent, open circuit, etc.) | |
| Additional Components | Frame | Steel construction, lockable casters, removable panels |
| Included Accessories | Chiller, silent compressor, tool kit, spare parts | |
| Measurement | Vacuum Gauge | INFICON combination gauge |
Key Advantages & Applications
Advantages:
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High Precision: Ultra-high vacuum (UHV) capability ensures contamination-free thin-film deposition.
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Flexibility: Multi-target configuration with adjustable parameters for diverse materials (including magnetic films).
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Reliability: Robust PLC automation with fail-safe interlocks and real-time diagnostics.
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User-Friendly: Integrated touchscreen and PC control streamline operation.
Target Applications:
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Research & Development: Ideal for academic or industrial labs studying advanced coatings (e.g., semiconductors, optics).
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Industrial Coating: Suitable for small-scale production of functional films (wear-resistant, conductive, or decorative layers).
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Material Science: Supports experiments requiring controlled environments (e.g., reactive sputtering, multi-layer deposition).
IPv6 network supported 