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Small High Vacuum Magnetron Upward Sputtering Coater Coating Machine

Contact Person:Gilia Ding


Email: gilia@inthelaboratory.com

Tel:+86 177 5900 4070
Telephone:+86-177-59004070
Whatsapp: +86 177 5900 4070
Wechat:Dingqiuna



  • Item no.:

    LITH-JCP350
  • Payment:

    L/C, T/T, Western Union, Credit Cards, Paypal
  • Lead Time:

    7 days
  • Compliance:

    CE Certified
  • Warranty:

    Two years limited standard warranty
  • Product Detail

Small High Vacuum Magnetron Upward Sputtering Coater Coating Machine 

  

 



I. Equipment Overview

1. Applicable: universities and colleges, research institutes and enterprises for scientific research and small batch preparation of new thin film materials.

2. Product features/uses:

► Small footprint, cheap price, stable performance and low cost of use and maintenance;

► Can be used to prepare single-layer and multi-layer metal film, dielectric film, magnetic film, sensor film and heat-resistant alloy film, hard film, corrosion-resistant film, etc;

► Coating examples: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silicon dioxide, etc;

► Single-target sputtering, multi-target sequential sputtering, common sputtering and other functions.

 

II. Technical parameters

Model

JCP350

Vacuum chamber structure

Vertical top-opening lid structure, rear extraction system, pneumatic lifting open type

Vacuum chamber size

Φ350×H350mm

Heating temperature

Room temperature500℃

Sputtering method

Upward sputtering

Rotating substrate table

Φ120mm

Film thickness non-uniformity

Φ75mm range ≤±5.0%

Sputtering target/evaporation electrode

Φ2 inch magnetron target 2pcs, compatible with DC/RF sputtering

Process gas

2-3 way gas flow control

Control method

PLC + touch screen human-machine interface semi-automatic control system

Floor space

(Host) L1600×W800×H1920mm

Total power

≥8KW

Sputtering Coater

 



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