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Lab Small High Vacuum Magnetron Sputtering Coater with Room Temperature to 500C

Contact Person:Gilia Ding


Email: gilia@inthelaboratory.com

Tel:+86 177 5900 4070
Telephone:+86-177-59004070
Whatsapp: +86 177 5900 4070
Wechat:Dingqiuna



  • Item no.:

    LITH-JCP500
  • Payment:

    L/C, T/T, Western Union, Credit Cards, Paypal
  • Lead Time:

    7 days
  • Compliance:

    CE Certified
  • Warranty:

    Two years limited standard warranty
  • Product Detail

Lab Small High Vacuum Magnetron Sputtering Coater with 


Room Temperature to 500C

  

 


I. Product Overview

1. Applicable: universities and colleges, research institutes and enterprises for scientific research and small batch preparation of new thin film materials.

2. Product features/uses:

► Small footprint, inexpensive, stable performance, low cost of use and maintenance;

► can be used for the preparation of single-layer and multi-layer metal film, dielectric film, magnetic film, sensor film and heat-resistant alloy film, hard film, corrosion-resistant film, etc.;

► coating examples: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silicon dioxide, etc;

► single target sputtering, multi-target sequential sputtering, common sputtering and other functions.

 

II. Technical parameters

Model

JCP500

Vacuum chamber structure

Vertical front door structure, rear extraction system

Vacuum chamber size

Φ500×H420mm

Heating temperature

Room temperature500℃

Sputtering method

Upper and lower sputtering optional

Rotating substrate table

Φ150mm

Film thickness non-uniformity

Φ100mm range ≤±5.0%

Sputtering target/evaporation electrode

Φ3 inch magnetron target 3pcs, compatible with DC/MF/RF sputtering

Process gas

2~3 way gas flow control

Control method

PLC+touch screen human-machine interface semi-automatic control system

Floor space

(Main machine) L1900×W800×H1900mm

Total power

≥10KW

 

Sputtering Coater


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