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Small Auto Vaccum Carbon DC Sputter Coater
Model: Lith-BY-JS10 – Product Specifications
1. Technical Specifications Table
| Parameter | Specification |
|---|---|
| Model Number | Lith-BY-JS10 |
| Vacuum Pump | Oil-required Rotary Vacuum Pump (Explicit oil filling needed) |
| Pumping Speed | 50Hz: 16 m³/h (4.4 L/s) • 60Hz: 19.2 m³/h (5.2 L/s) • 20% speed boost at 60Hz |
| Ultimate Vacuum | 2 Pa |
| Max Sputtering Current | 1.6A |
| Operating Pressure Range | 20 Pa – 8 Pa |
| Pump-Down Time | <5 min (to 2 Pa) |
| Vacuum Measurement Range | Atmospheric pressure to 2×10⁷ mbar |
| Gas Control System | Precision Gas Flow Controller |
| Chamber Specifications | Ø350 × 240mm (H) • Scratch-resistant quartz glass viewport |
| Target Specifications | Ø200mm • Materials: Au, Ag, Pt, Cu (noble/conductive metals) |
| Operation | Instruction manual guided |
| Dimensions/Weight | 490(L) × 400(W) × 590(H) mm • 70 kg |
| Power Requirements | Dual-voltage: AC 110V/60Hz (Americas) or AC 220V/50Hz (Europe/Asia) |
| Power Consumption | <1500W |
| Warranty & Support | 1-year limited warranty + lifetime technical support |
2. Key Features & Competitive Advantages
Precision-Oriented Design
- Dual-Frequency Pumping: Automatically adapts to 50Hz/60Hz power grids (19.2 m³/h vs 16 m³/h) for global compatibility.
- Scratch-Resistant Quartz Viewport: Ensures long-term visibility during deposition without degradation.
- Oil-Lubricated Vacuum Pump: Delivers stable 2 Pa base pressure (vs. dry pumps), critical for consistent thin-film quality.
Material Versatility
- Broad Target Compatibility: Supports Au/Ag/Pt/Cu targets for conductive/noble metal coatings.
- Rapid Process Setup: <5-minute pump-down enables efficient batch processing.
User-Centric Engineering
- Global Voltage Support: No external converter needed for 110V/220V operation.
- Compact Footprint: Benchtop design (0.49×0.4×0.59m) saves lab space.
IPv6 network supported 