Lab Mini Auto PVD Ion Sputtering Coater For Carbon Coating
Model: Lith-JY-JS01-SEM Preparation
Overview
The Lith-JY-JS01 compact magnetron ion sputtering coater is designed for high-quality conductive coating (e.g., gold film) onSEM samples or material surfaces. Featuring stable performance and user-friendly operation, it employs cold magnetron sputtering technology, minimizing heat generation to protect sensitive samples.
Key Features
· Durable Metal Bellows – Corrosion-resistant and aesthetically refined vacuum pump tubing.
· Precision Adjustment – Sensitive micro-valve control with clear scale markings.
· High-Efficiency Vacuum Pump – Fast pumping speed (8 m³/h) with low noise, ideal for lab environments.
· Reliable Circuitry – Stable control board for consistent operation.
· Cold Sputtering – Near-zero temperature rise preserves sample integrity.
Technical Specifications
Parameter
Specification
Vacuum Chamber
Ø150 mm × 110 mm (H)
Sample Stage
Ø60 mm
Gold Target Size
Ø50 mm
Vacuum System
Pumping speed: 8 m³/h
Vacuum Monitoring
Custom Pirani gauge + analog dial
Exhaust Mode
Automatic
Sputtering Time
0–1000 sec (programmable)
Process Gas
Air or argon (dedicated inlet)
Compatible Target Materials
Au, Au/Pd, Pt, Pt/Pd, Cu, Ag, etc.
Dimensions
~450 × 330 × 235 mm (L×W×H)
Applications & Advantages
· SEM Sample Prep: Uniform conductive coatings enhance imaging accuracy.
· Material Science: Versatile metal deposition for thin-film research.
· User-Centric Design: Fast target switching, low maintenance, and lab-friendly noise levels.
Ideal for: Academic labs, quality control, and R&D requiring precision coating with minimal thermal impact.
Overview
The Lith-JY-JS01 compact magnetron ion sputtering coater is designed for high-quality conductive coating (e.g., gold film) onSEM samples or material surfaces. Featuring stable performance and user-friendly operation, it employs cold magnetron sputtering technology, minimizing heat generation to protect sensitive samples.
Key Features
· Durable Metal Bellows – Corrosion-resistant and aesthetically refined vacuum pump tubing.
· Precision Adjustment – Sensitive micro-valve control with clear scale markings.
· High-Efficiency Vacuum Pump – Fast pumping speed (8 m³/h) with low noise, ideal for lab environments.
· Reliable Circuitry – Stable control board for consistent operation.
· Cold Sputtering – Near-zero temperature rise preserves sample integrity.
Technical Specifications
|
Parameter |
Specification |
|
Vacuum Chamber |
Ø150 mm × 110 mm (H) |
|
Sample Stage |
Ø60 mm |
|
Gold Target Size |
Ø50 mm |
|
Vacuum System |
Pumping speed: 8 m³/h |
|
Vacuum Monitoring |
Custom Pirani gauge + analog dial |
|
Exhaust Mode |
Automatic |
|
Sputtering Time |
0–1000 sec (programmable) |
|
Process Gas |
Air or argon (dedicated inlet) |
|
Compatible Target Materials |
Au, Au/Pd, Pt, Pt/Pd, Cu, Ag, etc. |
|
Dimensions |
~450 × 330 × 235 mm (L×W×H) |
Applications & Advantages
· SEM Sample Prep: Uniform conductive coatings enhance imaging accuracy.
· Material Science: Versatile metal deposition for thin-film research.
· User-Centric Design: Fast target switching, low maintenance, and lab-friendly noise levels.
Ideal for: Academic labs, quality control, and R&D requiring precision coating with minimal thermal impact.








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