Benchtop DC/RF Magnetron Sputtering Conductive Coater For Metals, Oxides & Ceramics & Semiconductors

Model:  Lith-PD-JS01-DC/RF Sputtering, Multi-Target, Uniform Coating (±5%), Fast Deposition

Product Overview

The Lith-PD-JS01 is a compact magnetron sputtering system designed for laboratory-scale thin-film deposition. Compatible with both DC and RF sputtering sources, it supports the coating of metals, non-metals, and compound films (e.g., ITO). Ideal for academic and industrial research, it enables the preparation of single/multilayer films and facilitates advanced material/process development.

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Key Features

1. Robust Construction

·All-stainless-steel vacuum chamber ensures durability and operational safety.

·Optimized gas path design for enhanced process control.

2. Space-Efficient & Modular

·Compact footprint (500×360×380mm) with modular expandability, maximizing lab space utilization.

3. High-Efficiency Vacuum System

·Hybrid mechanical + imported molecular pump achieves high vacuum (≤3×10⁻⁵ Pa) in 15–20 minutes, reducing downtime.

4. Precision Process Control

·Uniformity: ≤±5% over Ø80mm substrate area.

·Rotating Substrate Holder: Adjustable speed (0–20 RPM) with magnetic fluid sealing for stable deposition.

5. Flexible Configuration

·Sputtering Sources: 2–3 × 2-inch targets (DC/mid-frequency/RF).

·Gas System: 1–3 gas inlets with ±1% flow accuracy (20 sccm).

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Technical Specifications

Parameter	Specification
Vacuum Chamber	Ø260 × H280mm (304 stainless steel, cylindrical, viewport)
Vacuum System	Mechanical pump + imported molecular pump
Base Pressure	≤3×10⁻⁵ Pa
Pump-down Time	≤3×10⁻⁴ Pa in 15min
Substrate Holder	Max. Ø80mm, rotation speed 0–20 RPM (adjustable)
Sputtering Sources	2–3 × 2-inch targets; 1KW DC/mid-frequency/RF power supply
Uniformity	≤5% (Ø80mm area)
Gas Control	1–3 channels, ±1% accuracy (20 sccm max)
Control Mode	Manual button or PLC touchscreen (with safety interlocks)
Power Supply	AC220V/50Hz, 2.5KW
Dimensions (L×W×H)	500 × 360 × 380mm

Optional Upgrades: Substrate heating/cooling, dry pump, additional flow meters, water chiller.

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Target Applications

· Research: Thin-film studies (metals, oxides, semiconductors).

· Education: Lab demonstrations and student projects.

· Industry: Prototyping for electronics, optics, and energy materials (e.g., ITO for solar cells).

Why Choose?

· Fast turnaround: Rapid pump-down accelerates experimental cycles.

· Scalable: Modular design adapts to evolving research needs.

· User-centric: Intuitive controls and safety features streamline operation.