Tel : +86-592-3926659
Email : gilia@inthelaboratory.com
Dual-Source Vacuum Evaporation PVD System Machine For Metal, OLEDs, Organic
Lith-QH-ZD02-High-Vacuum Multi-Material Evaporation
Technical Specifications
|
No. |
Parameter |
Description |
|
1 |
Ultimate Vacuum |
≤4×10⁻⁵ Pa (new equipment) |
|
2 |
Leak Rate |
6.7×10⁻⁸ Pa·L/S |
|
3 |
Working Vacuum |
5×10⁻⁴ Pa (Time to reach from atmosphere: <30 min, cold state with glovebox integration) |
|
4 |
Pressure Holding |
≤2 Pa after 12 hours (post pump shutdown) |
|
5 |
Sample Size |
130×130 mm (16× 25×25 mm samples; includes 2 sets) |
|
6 |
Sample Holder Size |
146×146 mm |
|
7 |
Source-Substrate Distance |
320 mm |
|
8 |
Sample Rotation |
0–30 RPM (water-cooled) |
|
9 |
Evaporation Sources |
4× metal + 4× organic sources (2 organic sources on inner/outer door, 2 metal sources on each side) |
|
10 |
Substrate Lift |
Fixed (non-adjustable) |
|
11 |
Chamber Access |
Manual front-opening door |
|
12 |
Thickness Probes |
4× water-cooled probes (above sources) |
|
13 |
Mask Storage |
Optional |
|
14 |
Sample Loading |
Side-insertion |
|
15 |
Deposition Control |
Auto rate/power/temperature control |
|
16 |
Pumping System |
Automated vacuum sequencing |
|
17 |
Film Uniformity |
±5% (for 100 nm films) |
|
18 |
Safety Features |
Anti-implosion, auto gas refill, environmental thermocouple |
Key Features
1. High-Precision Deposition Control
· Automated Rate/Power/Temperature Control: Ensures repeatable thin-film growth for research and small-scale production.
· Real-Time Thickness Monitoring (4× Probes): Enables accurate multilayer deposition with ±5% uniformity.
· Dual-Source Configuration (4 Metal + 4 Organic): Supports co-evaporation for advanced materials like perovskites and organic semiconductors.
2. Optimized for Efficiency & Stability
· Fast Pump-Down (<30 min to 5×10⁻⁴ Pa): Reduces downtime between batches, improving lab productivity.
· Low Leak Rate (6.7×10⁻⁸ Pa·L/S): Maintains ultra-high vacuum integrity for sensitive processes.
· Long-Term Pressure Holding (≤2 Pa after 12 hours): Minimizes re-pumping time for multi-step experiments.
3. User-Friendly Design
· Side-Loading & Front-Opening Chamber: Compatible with glovebox workflows, reducing contamination risks.
· Water-Cooled Sample Rotation (0–30 RPM): Enhances film homogeneity while preventing thermal damage.
· Optional Mask Storage: Enables patterned deposition for micro/nanofabrication.
4. Robust Safety Protections
· Anti-Implosion Design: Safeguards against chamber breaches during high-vacuum operation.
· Auto Gas Refill & Environmental Thermocouple: Protects samples and equipment during reactive material handling.
Application Areas
1. Advanced Optoelectronic Research
· OLEDs & Organic Electronics: Precise co-evaporation of metal-organic layers for emissive devices.
· Perovskite Solar Cells: Uniform thin-film deposition for high-efficiency photovoltaic research.
· Quantum Dots & 2D Materials: Controlled growth of nanoscale films for photonics and sensors.
2. Industrial Thin-Film Development
· Barrier Coatings: Ultra-thin encapsulation layers for flexible electronics.
· MEMS & Sensors: High-purity metal/oxide deposition for microfabrication.
· Optical Coatings: Low-defect films for lenses, mirrors, and filters.
3. Customizable for Specialized Needs
· In-Situ Monitoring Upgrades: Additional diagnostics (e.g., RHEED, quartz crystal microbalance) available.
· Multi-Source Expansion: Accommodates complex material stacks (e.g., ternary systems).
Why Choose This System?
✔ Lab-Optimized Throughput: Balances high sample capacity (16×25 mm substrates) with research-grade precision.
✔ Glovebox-Compatible: Ideal for air-sensitive materials like lithium or reactive organics.
✔ Future-Ready Design: Modular options support evolving thin-film R&D demands.
IPv6 network supported 