Benchtop Magnetron Sputtering Coater For Conductive Thin Film Deposition
Model: Lith-BY-JS06-Benchtop System for R&D and Educational Laboratories
Overview
The Lith-BY-JS06 is a compact, cost-effective, high-vacuum magnetron sputtering system designed for pilot-scale experiments in research and educational laboratories. It integrates key components, including a sputtering vacuum chamber, permanent magnet targets (strong/weak magnetic fields), a fiber-optic rotary stage (customizable), DC power supply, gas supply system, pumping system, water cooling system, film thickness monitoring, vacuum measurement, electronic control system, and a sturdy mounting frame.
Key Parameters
|
Parameter |
Specification |
|
Sputtering Gas |
Adjustable (e.g., argon, nitrogen, etc., depending on experimental requirements). |
|
Target Material |
Standard: Gold target; Optional: Silver, copper, chromium, etc. |
|
Target Configuration |
50mm (weak magnetic target) / 60mm (strong magnetic target). |
|
Sputtering Current |
0–500mA |
|
Ultimate Vacuum |
≤5×10−4 Pa |
|
Chamber Dimensions |
Diameter: 180mm; Height: 200mm |
|
Sample Stage |
Fiber-optic rotary stage (customizable). |
|
Operating Voltage |
230V, 50Hz |
Applications & Features
1. Coating for Electron Beam-Sensitive Samples
· Ideal for: Biological specimens, polymers, and other beam-sensitive materials.
· Advantage: In SEM imaging, high-energy electron beams can cause thermal damage to delicate samples. A thin sputtered conductive coating (e.g., gold or carbon) acts as a protective layer, preserving sample integrity while enhancing imaging quality.
2. Non-Conductive Samples
· Ideal for: Insulating materials (e.g., ceramics, glass, or organic compounds).
· Advantage: Non-conductive samples accumulate surface charges ("charging effect") under electron beams, distorting SEM images. A sputtered conductive metal layer (e.g., gold or platinum) dissipates charges, eliminating artifacts and improving signal-to-noise ratio for clearer imaging.
3. Electrode Fabrication & Conductivity Studies
· Ideal for: Novel materials requiring conductive electrodes for electrical property analysis.
· Advantage: Enables precise deposition of thin conductive films for experimental electrode fabrication, facilitating studies on material conductivity.








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