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PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine

Contact Person:Gilia Ding


Email: gilia@inthelaboratory.com

Tel:+86 177 5900 4070
Telephone:+86-177-59004070
Whatsapp: +86 177 5900 4070
Wechat:Dingqiuna



  • Item no.:

    Lith-BY-JS07
  • Payment:

    L/C, T/T, Western Union, Credit Cards, Paypal
  • Lead Time:

    7 days
  • Compliance:

    CE Certified
  • Warranty:

    Two years limited standard warranty
Categories
  • Product Detail

PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine


Dual-function SEM Sample Preparation Instrument


1. Technical Specifications

Vacuum System

Parameter

Specification

Rotary Pumping Speed

50 Hz: 8 m³/h (2.2 L/s) / 60 Hz: 9.6 m³/h (2.6 L/s)

Vacuum Limit

2 Pa

Max Sputtering Current

100 mA

Max Evaporation Current

100 A

Sputtering Working Pressure

20 Pa – 8 Pa

Evaporation Working Pressure

6 Pa – 4 Pa

Working Vacuuming Time

< 5 min (to 2 Pa)

Vacuum Measurement

Atmosphere to 2×10 mbar

Gas Control

Gas Flow Controller

Chamber Size

Ø150 × 120 mm (height), scratch-resistant quartz glass

Magnetron Target Source

Ø50 × 0.1 mm (Au) / Optional: Au, Ag, Pt

Evaporation Target Source

Carbon Rope

Operation Method

Manual (instruction manual included)

Dimensions (Main Unit)

360 mm (L) × 300 mm (W) × 380 mm (H)

Dimensions (Evaporation Unit)

360 mm (L) × 300 mm (W) × 160 mm (H)

Weight

55 kg

Power Supply

AC 110V 60Hz or AC 220V 50Hz

Power Consumption

< 2000 W

Cooling Method

Air Cooling (Evaporation) + Water Cooling (Sputtering)

Warranty

1-year limited warranty with lifetime product support

Sputtering Parameters

· Sputtering Targets: Au (standard), optional Ag, Pt, Cr, Al, Cu

· Target Size: Ø50 mm

· Sample Stage: Adjustable height, accommodates Ø50 mm and Ø70 mm samples (customizable)

· Sputtering Voltage: 0–1600 V (DC, adjustable)

· Sputtering Current: 0–50 mA

· Sputtering Time: 0–360 s

Evaporation Parameters

· Evaporation Material: Carbon fiber rope

· Evaporation Current: 0–100 A (AC)

· Evaporation Voltage: 0–30 V

· Evaporation Time: 0–1 s

· Micro Vacuum Valve: Compatible with Ø3 mm tubing

General

· Input Voltage: 220 V (110 V optional), 50 Hz

· Vacuum Pump: 2 L/s rotary vane pump (domestic VRD-8)


2. Key Features

Dual-Function Advantages

· Integrated Design: Combines metal sputtering and carbon evaporation in one compact system

· Process Flexibility: Switch between conductive metal coatings (Au/Ag/Pt) and ultra-thin carbon films

· Time Efficiency: 5-minute pump-down enables rapid sample processing

User-Centric Design

· Transparent chamber for real-time monitoring

· Ergonomic controls with preset programs

· Tool-free target replacement system

Sputtering Coating System

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