Low-Temperature Large-Target Magnetron Sputtering PVD Coater Equipment For SEM Preparation
Model: Lith-HZ-JS02-Low-Temperature SEM Preparation
Key Features & Applications
The Lith-HZ-JS02 Magnetron Sputtering System integrates advanced vacuum technology with intelligent automation, delivering high uniformity, efficiency, and versatility for precision thin-film deposition. Its large-target design and planar magnetron cathode minimize plasma-induced thermal damage, making it ideal for temperature-sensitive samples (e.g., polymers, fibers, biological specimens) and high-resolution SEM preparation.
Technical Parameters
Category
Specifications
Dimensions
530 × 300 × 320 mm
Input Voltage
100–250 VAC, 50/60 Hz
Sputtering Voltage
300–600 V (DC)
Target Material
Ø50 × 0.1 mm (Au, Pt, Ag, Pd, etc.)
Control Mode
5-inch touchscreen (ARM architecture, bilingual UI)
Power Consumption
100 W
Sputtering Current
10–50 mA (1 mA precision)
Sputtering Time
0–600 s (1 s step)
Working Vacuum
2–10 Pa (0.1 Pa resolution)
Ultimate Vacuum
<1 Pa
Vacuum Measurement
Full-range Pirani gauge
Chamber Size
Ø160 × 120 mm
Sample Stage
Ø80–100 mm (holds 12 standard stubs)
Protections
Overcurrent, vacuum safety
System Components
1. Sputtering Source: Planar magnetron cathode for Au/Pt/Pd/Ag deposition.
2. Power Supply: Constant-current DC (300–600 V, ±1 mA precision).
3. Vacuum System: Rotary vane pump (<1 Pa), Pirani monitoring.
4. Automation: One-touch operation with parameter memory.
5. Data Display: Real-time curves for current, voltage, and vacuum status.
Advantages
· Nano-scale Coating: Particle size <5 nm, ideal for high-resolution SEM.
· Low Thermal Impact: Magnetron technology reduces sample heating.
· High Throughput: 12-sample capacity with auto-rotation for uniformity.
· Plug-and-Play: No specialized training required.
Ideal for: Material science, biology, and conductive/thermal enhancement of non-metallic samples.
Operation Notes
· Target Replacement: Tool-free design with shielded ring mechanism.
· Maintenance: Oil-lubricated pump (included) with visual oil-level window.
· Gas Connection: Supports Ar/N₂ or ambient air (6 mm OD tubing).
|
Category |
Specifications |
|
Dimensions |
530 × 300 × 320 mm |
|
Input Voltage |
100–250 VAC, 50/60 Hz |
|
Sputtering Voltage |
300–600 V (DC) |
|
Target Material |
Ø50 × 0.1 mm (Au, Pt, Ag, Pd, etc.) |
|
Control Mode |
5-inch touchscreen (ARM architecture, bilingual UI) |
|
Power Consumption |
100 W |
|
Sputtering Current |
10–50 mA (1 mA precision) |
|
Sputtering Time |
0–600 s (1 s step) |
|
Working Vacuum |
2–10 Pa (0.1 Pa resolution) |
|
Ultimate Vacuum |
<1 Pa |
|
Vacuum Measurement |
Full-range Pirani gauge |
|
Chamber Size |
Ø160 × 120 mm |
|
Sample Stage |
Ø80–100 mm (holds 12 standard stubs) |
|
Protections |
Overcurrent, vacuum safety |








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