Lab High Vacuum Magnetron Dual-head Sputtering Coater with Rotary Vacuum Pump
Technical Specifications
|
Vacuum Pump Set |
(Oil required) Rotary Vacuum Pump + (Oil free) Turbo Molecular Pump set |
|
Rotary Pumping Speed |
50 Hz : 16m3/h (4.4 L/s) / 60 Hz : 19.2m /h (5.2 L/s) |
|
Molecular Pumping Speed |
300 L/s |
|
Vacuum Limit |
5 x10-5Pa |
|
Working Pressure |
0.5-5 Pa |
|
Vacuuming Time |
>10 Min(10-3Pa) |
|
Vacuum Measure |
Measuring range from atmosphere to 10-6Pa |
|
Gas Control |
Gas Flow Controller |
|
Chamber Size |
φ260*200mm (height) Metal |
|
Magnetron Target Source |
Target sizeφ50*3mm (Cu) / Target source: Weak Magnetic Substance / Materials |
|
Operation Method |
Instruction Manual |
|
Weight / Size |
100kg / 610mm length*420mm wide*490mm high |
|
Power Supply |
AC 110V 60Hz or AC 220V 50Hz |
|
Power Consumption |
<3000W |
|
Cooling Method |
Air Cooling(Pump) + Water Cooling(Sputtering Target) |
|
Warranty |
One year limited warranty with lifetime product support |







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