Lab DC or RF High Vacuum Magnetron Ion Sputter Coating 

Coater

Introduction

High Vacuum Magnetron Ion Sputtering Coater is ideal and designed for materials science and sample preparation. It is widely used for the majority of universities and scientific research institutes of materials science and engineering to coat, for metals, ceramics, semiconductors, insulators or other kinds of membrane material preparation.

High Vacuum Magnetron Ion Sputtering Coater provides the most stable sputtering environment and achieves the basic experimental conditions of magnetron sputtering in a very short period of time. It provides DC / RF two kinds of sputtering power options which allow sputtering conductive or non-conductive substance on specimen and improves physical vapor deposition (PVD) Performance. It is also excellent for surface treatment and coating. It is easy to operate and user friendly as well.

Vacuum pump and Chiller are included.

 

Parameter

Vacuum pump set	(Oil required) rotary vacuum pump+(oil free) turbo moleculan pump set
Rotary pumping speed	50 Hz : 16 m³/h (4.4 L/s)/ 60 Hz : 19.2m³/h (5.2 L/s)
Molecular pumping speed	300 L/s
Vacuum limit	5x10-5Pa
Working pressure	0.5-5 Pa
Vacuuming time	>10 Min(10-3Pa)
Vacuum measure	Measuring range from atmosphere to 1*10Pa
Gas control	Gas flow controller
Chamber size	φ260*200mm (height) metal
Magnetron target source	Target size φ 50*3mm(Cu)/target source: weak magnetic substance /materials
Operation method	Instruction Manual
Weight/size	100kg/610mm length x 420mm wide x 490mm high
Power supply	AC 110V 60Hz or AC 220V 50Hz
Power consumption	<3000W
Cooling method	Air cooling(pump)+ water cooling(sputtering target)
Warranty	One year limited warranty with lifetime product support