• Chamber dimension: 1200 mm L x 740 mm W x 900 mm H, made of stainless steel.
• Hinged type front door for loading devices and sample easily
•  Automic purging function for quickly removing O2 and H2O before recirculating purification
• Automatic regeneration function is built-in in the control panel
• High-quality purification system ensures O2 and H2O below 1 PPM
• Two Antechambers for large and small samples delivery
• Please click the picture at the left-column for detailed specifications of the glovebox.

• The coater is recessed in the bottom of the glovebox with air-tight flange.
• Two 2" magnetron plasma sputtering guns are installed on the top of the cover, which is a hinged type door. 
• Two sputtering power sources are integrated into one control unit and are placed outside the glovebox.
• One DC source: 500 W power for coating metallic materials (Pic 1)
• One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials (Pic 2)
•  -- Pic 1  -- Pic 2
• Please click the picture at the left column to see the detailed specification of the sputtering coater

• Single-phase 220 VAC 50 / 60 Hz
• 2500 W (including a vacuum pump and water chiller)

Magnetron Sputtering Head

• Two 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included (Click 1st pic)
• One is connected to DC source for coating metallic materials
• The other one is connected to the RF source for non-conductive materials
• Target size requirement: 2" diameter
• Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including the backing plate)
• One Stainless Steel Target target and one Research Grade Al2O3 target are included for demo testing
• Recommended Sputtering Recipe and Useful Tips
• 

Vacuum Chamber

• Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel
• Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement
• Hinged type lid with pneumatic power pole allows easy target change on

Sample Stage

• The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
• Sample holder size: 140 mm Dia. for. 4" wafer max
• Rotation speed: 1 - 20 rpm adjustable for uniform coating
• The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas & Flow Control

• One digital temperature-controlled recirculating water chiller is included. (Click picture to see details)
• Refrigeration range: 5~35 °C
• Flow rate: 16 L/min
• Pump pressure: 14 psi

Compliance

• CE approval
• NRTL Certification (UL 1450) is available upon request at extra cost