Desktop Pulsing Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment

Model: Lith-BY-ZD02-Pulsing Thermal Evaporation Carbon Coater

1. Product Overview

Introduction

The Lith-BY-ZD02 Pulsing Thermal Evaporation Carbon Coater is an advanced deposition system designed for ultra-thin carbon film coating in SEM, TEM, and EBSD applications. Utilizing resistive heating of high-purity carbon rope, it enables precise, fast, and contamination-free carbon film deposition with adjustable parameters for optimized coating quality.

Key Technologies & Advantages

✔ Dual Deposition Modes – Supports Flash & Pulsed evaporation (0-9 pulses) for controlled, low-debris coating.
✔ Touchscreen Control – User-friendly interface for precise current/pulse adjustment.
✔ Adjustable Evaporation Current (50A-80A) – Prevents sample damage while ensuring uniform coating.
✔ Vacuum Protection System – Safeguards against low-vacuum short circuits.
✔ Compact & Efficient – Optimized for lab environments with rapid pump-down (<5 min).

2. Technical Specifications

Core Parameters

Vacuum System Performance

· Pumping Speed:

o 50Hz: 8 m³/h (2.2 L/s)

o 60Hz: 9.6 m³/h (2.6 L/s)

· Time to Reach Vacuum: <5 minutes (to 2 Pa)

· Vacuum Measurement Range: Atmosphere to 2×10⁻² mbar

3. Applications

· High-Resolution SEM/TEM – Minimizes charging effects.

· EBSD Analysis – Enhances electron backscatter diffraction signals.

· X-ray Microanalysis – Provides conductive layers with minimal interference.

4. Operational Highlights

Pulsed Evaporation Technology

· Reduces Debris: Short pulses limit carbon splashing for cleaner coatings.

· Controlled Thickness: Programmable pulses (0-9) enable repeatable deposition.

User-Centric Design

· Touchscreen Interface: Intuitive control for current/pulse adjustment.

· No Process Gas Required: Simplified operation compared to sputtering systems.