• 208-240 VAC, single phase, 50/60 Hz, 500 W
  

• DC source: 500 W power for coating metallic materials 
• RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials

Magnetron Sputtering Head

• Two 2" Magnetron Sputtering Heads with water cooling jackets and shutters
• One is connected to a DC source for metallic materials
• The other is connected to the RF source for non-conductive materials
• Target size: 2" diameter with a thickness of 0.1 - 5 mm
  
• Sputtering targets are optional
• Recommended Sputtering Recipe and Useful Tips
  
  
• 3 RF heads model is available
• Extra 148 cm RF cable can be ordered at extra cost for the replacement
• Four heads sputtering system is available upon request (Pic. 5)
•                    Pic. 5

Vacuum Chamber

• Stainless steel vacuum chamber: Ø300 × 300 mm H
• One 100 mm glass view port. 
• Hinged type top flange for easy sample access
• Here is a glance of the vacuum chamber
•      

Sample Stage

• Ø140 mm rotating and heating sample stage up to 500°C 
• Rotation speed: 1 - 20 rpm
• Single-point programmable temperature controller
  
•  

Gas Flow Control

• Two mass flow controllers (MFC)
• Flow rate: 0 – 200 sccm
• nitrogen calibrated
• 1/4" vent port.

Vacuum Pump Station

(Optional)

• For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station is recommended
• Turbo pump . 
  • 63 L/s turbomolecular pump, or
  • 260 L/s turbomolecular pump
• Backing pump
  • 240 L/min rotary vane pump, or
  • 200 L/min dry scroll pump

Water Chiller

(Optional)

• Chilled water is required
• One digital temperature-controlled recirculating water chiller is recommended
• Refrigeration range: 5~35 °C
• Flow rate: 16 L/min
• Pump pressure: 14 psi

• Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å

Overall Dimensions

• Lid closed: 48" × 28" × 32"
  
  
• Lid open: 48" × 28" × 37"
  
  

Net Weight of Coater

• 160 kg

Shipping Weight & Dimensions

• Total 2 Pallets
• #1: 520 lbs, 52" x 40" x 50"
• #2: 420 lbs, 48" x 40" x 45"

Compliance

• CE approval
• NRTL Certification (UL 1450) is available upon request at extra cost

 Application Notes

• Please use 5N purity Argon gas for plasma sputtering. 
• For best performance, the non-conductive targets must be installed with a copper backing plate. Please refer to the instruction video below for target bonding (Click Pic #3 below)
• MTI supplies single crystal substrate from A to Z (Click Pic #4 below to order) 
• MTI Sputtering Coaters have successfully coated ZnO on Al₂O₃ substrate at 500 °C (XRD profile in Pic #5 below)
• HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the RF / DC generator before sample loading and target changing operations
• DO NOT use DI water in a water chiller. Use distilled water
• The coater can be placed into glovebox as the Pic. 6 at extra cost ( must order glovebox together)

• Pic 3

  Pic 5

  Pic. 6